Extending ion-track lithography to the low-energy ion regime
نویسندگان
چکیده
منابع مشابه
Ion-track lithography for thermoelectric applications
This work presents a novel process to fabricate nanostructures for thermoelectric applications by a combination of a traditional silicon microfabrication techniques, electroplating, and submicron ion-track nanolithography. Polyimide (Kapton HN, PI2731), and PMMA (polymethyl methacrylate) were ion-track irradiated and wet etched. Bi2Te3 nanowires (80 and 120 nm diameter) were electroplated with ...
متن کاملLOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS
Radiation enhanced diffusion at the surface of metals has been observed and studied for low-energy nitrogen ions at the surface of copper. The displacement of the target atoms during irradiation creates vacancies and other defects near the surface, thus enhancing the diffusion of implanted materials toward the surface and also into the solid. The mechanism has been studied here by a specia...
متن کاملTowards a nanostructured thermoelectric generator using ion-track lithography
This paper presents the process development towards a new generation of nanostructured thermoelectric generators for power harvesting from small temperature gradients by using a combination of traditional silicon microfabrication techniques, electroplating and submicron ion-track nanolithography. Polyimide nanotemplates with pore diameters ranging from 30 nm to 120 nm were fabricated. Prelimina...
متن کاملlow-energy-ion enhanced diffusion at the surface of metals
radiation enhanced diffusion at the surface of metals has been observed and studied for low-energy nitrogen ions at the surface of copper. the displacement of the target atoms during irradiation creates vacancies and other defects near the surface, thus enhancing the diffusion of implanted materials toward the surface and also into the solid. the mechanism has been studied here by a special met...
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 2006
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.2200387